NEW PHOTOSENSITIVE RESINS @405 nm: APPLICATIONS TO 3D PRINTING

The field of 3D printing is today a hot topic. The development of new resins more efficient for such applications is today a real challenge. To this purpose, photosensitive systems are the key point to develop new high performance 3D printing system. The photo polymerization allows the transformation of multifunctional monomer or prepolymer into highly crosslinked networks by action of light  . According to the literature, photo polymerization of (meth)acrylate or epoxy monomers usually requires UV-curing. As UV wavelengths are known to be noxious, the development of new free radical initiating systems upon longer (safer) wavelengths irradiation such as 405 nm is crucial.